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Magnetron Sputtering Coater Introduction:
Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets available. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with three 300W RF power supplies, suitable for non-metal preparation. Three targets meet the needs of multi-layer or multiple coatings. Optional DC power supply and pulse power supply (300W to 1000W) are available upon request.
The coating machine features two-channel high-precision mass flowmeters, customizable up to four channels. Equipped with advanced turbomolecular pump sets, the ultimate vacuum reaches 1.0E-5Pa. Gas paths are controlled by multiple solenoid valves, allowing chamber access without shutting down the pump, significantly improving efficiency. Integration with an industrial computer allows precise control over vacuum systems and sputtering power.
Applications: This device is ideal for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and PTFE films. It is a preferred laboratory solution due to its compact size and easy operation.
| Sample Stage | Size: φ185mm | Temp Accuracy: ±1ºC |
| Heating: Max 500ºC | Rotate Speed: 1-20rpm | |
| Target Head | Quantity: 2" × 3 (1", 2" optional) | Water Chiller: 10L/min |
| Cooling: Water cooling | - | |
| Vacuum Chamber | Size: φ300mm × 300mm | Watch Window: φ100mm |
| Material: Stainless steel | Opening: Top cover open | |
| Mass Flowmeter | 2 channels; range 100sccm (Customizable) | |
| Vacuum System | Molecular Pump: CY-600 | Backing Pump: Rotary vane |
| Ultimate Vacuum: 1.0E-5Pa | Power: AC 220V 50/60Hz | |
| Rate: Vacuum up to 1.0E-3Pa in 20 minutes | ||
| Power | RF power supply × 3 | Max output: RF 300W |
| Dimensions | 600mm × 650mm × 1280mm | Total Weight: 300kg |
Other Magnetron Sputtering Equipment:
